Molybdenum Sputtering Targets



Molybdenum sputtering target is widely used in manufacturing LCD and touch screens (panels). It is also used for solar cells and solar water heating. We can provide pure molybdenum and molybdenum alloy targets with different shapes, including disc, planar, rotary as well as custom targets. 


Sputtering is a physical vapor deposition (PVD) method of depositing the evaporated target material onto the surface of the substrate forming a thin film layer.

Sputtering is the preferred vacuum deposition technique used by manufacturers of semiconductors, CDs, disk drives, and optical devices. It is used extensively in the semiconductor industry to deposit thin films of various materials in integrated circuit processing. Thin anti-reflection coatings on glass for optical applications are also deposited by sputtering. Sputtered films exhibit excellent uniformity, density, purity and adhesion.


Operating Principle:
Sputtering target materials for magnetron sputtering deposition, it is a new kind of physical vapor deposition (PVD) method

Add an orthogonal magnetic and electric fields In the sputtering target’s anode and cathode, and filling the gas (usually the Ar gas) In the high vacuum chamber

Ar gas ionization into positive ions and electrons. Under the action of electric field, Target has certain negative pressure, Electronic effected by magnetic field and its Ionization probability increases with working gas, then forming high density of plasma near the cathode, Ar ion under the action of lorentz force, speed up fly to the target surface, bombarding target surface at a high speed, making atoms sputtering from target fly to the substrate deposition film.


The Molybdenum sputtering targets we can provide are as follows:
Plate Target: Weight:≤200kg/pc, Purity:≥99.95%
Tube Target: Length:≤Φ165mmΧ1000mm ,Purity:≥99.95%


We can supply molybdenum target as per customers' requests.

If there are any other specs, please contact us with no hesitate!


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