Cathodes is consumable parts of ion implantation processes. It includes room, filament, curved slit, bracket, cathode, terminal station, analyzer element, insulator, spare parts.
Cathodes -- Accessories for Ion Implantation
Tungsten, molybdenum and alloys are ideal materials for consumable parts of ion implantation processes. It includes room, filament, curved slit, bracket, cathode, terminal station, analyzer element, insulator, spare parts.
Ion implantation is a very important technology in the manufacture of modern integrated circuits that utilize ion implanters to achieve semiconductor doping, that is, the use of tungsten wire as the cathode emission electrons to bombard the gas molecules containing specific impurity elements to produce ionized specific impurities The atoms are accelerated by the electrostatic field to the surface of the silicon monocrystalline wafer and into the interior of the semiconductor, changing the conductive properties and eventually forming the transistor structure.
parts for ion implantation
As the ion source is converted to plasma ions, will produce more than 2000 ℃ operating temperature, ion beam eruption, it will produce a large ion kinetic energy, the general metal will soon burn, so the need for high density of inertia Metal to maintain the direction of ion beam eruption, and increase the durability of components, tungsten and molybdenum is a mandatory material. As the tungsten and molybdenum materials, high temperature chemical stability, thermal deformation and long life and other advantages, so the semiconductor industry ion implantation ion source and the use of parts of the use of tungsten, molybdenum materials, including the launch of the electronic cathode shielding tube, Panel, the center of the fixed rod, the arc of the arc plate, etc., we collectively referred to as ion implantation tungsten parts and ion implantation molybdenum parts.
parts for ion implantation
Metal Properties in Ion implantation
Optimized by conventional tungsten and molybdenum materials, including fine particle size, alloying, vacuum sintering and hot isostatic pressing sintering densification, secondary grain refinement control and rolling technology, which materials share properties such as a high melting point, high creep resistance, excellent corrosion resistance, exceptional electrical and thermal conductivity, and high purity. Ion Implantation is a complex, sensitive, and crucial procedure in the manufacturing of semiconductors. Beam purity and process stability are critical to the success of the operation, provided that the ions are generated, concentrated, accelerated, and targeted towards the wafer in the beam path of the ion implanter.
Ion Implantation Equipment Structure
● Chambers (graphite, tungsten, molybdenum and alloys)
● Filaments (tungsten and tungsten alloys)
● Arc slits (graphite, tungsten, molybdenum and alloys)
● Holders (tungsten, molybdenum and alloys)
● Cathodes (tungsten, molybdenum and alloys)
● End station (graphite)
● Analyzer components (graphite)
● Insulators (ceramics)
● Spare parts (graphite, tungsten, molybdenum and alloys, ceramics, steel)
Why choose us ?
We manufacture spare parts of ultra-pure W, Mo, Re, and alloys for major ion implantation systems. Our in-house produced materials are qualified by leading companies in the ion implantation industry, and our parts rigidly follow the industry strict customized drawing. Our team consists of highly experienced and dedicated engineers who provide our clients with consistent- quality materials and assured fabrication accuracy. Our technicians have on average 15+ years of experience with refractory materials and experienced OEM fabrication. We are proud to provide our clients with high-performance products and localized customer services while still maintaining a competitive cost structure.
We could manufacturer according to your drawing.
Welcome to your inquiry for cathodes parts or any other parts in semiconductor field.